Microplastics

• Dimension (LxBxH) internal (mm): 954x605x587
• Laminar flow speed 0.35 m/s, laminar flow rate 669 m³/h
• Filters HEPA H14 filters according to EN 1822: efficiency of 99.995% MPPS and 99.999 % DOP
• UV light and fans with timer

• Programmable using software Tiamo
• 20 and 50 ml dosing unit 800 Dosino
• 802 Rod Stirrer with 804 Ti stand
• pH meter

• Maximum temperature: 2400 °C
• Atmosphere: air, Ar, vacuum

• Filament Sizes: 1.75mm and 2.85mm
• Material Capacity: Hopper: 3195.5 cm³, Screw Void:8 cm³, Feed Port: 3195.5 cm³
• Extrudable Plastics: PLA, ABS, PC, PP, PS, ULTEM, PEEK, NYLON, HDPE, PETG, and WAX
• Temperature Control: 4 Independently PID controlled heat zones, all with active fan cooling for consistent heating

• Puller Wheel Torque: 5 Nm
• Filament Diameter Range:5mm to 3.5mm
• Variable speed control with speed control knob
• 43.18 cm L x 24.13 cm H x 18.42cm W

• Chamber volume: 24 L
• Internal dimensions: φ294 x 350mm
• Heating power: 2.2 kW
• Admissible working pressure: 3.5 bar
• Admissible working temperature: 138 deg

• Range: 70–800 MPa
• Stroke: 200 mm
• Section: 49087 mm²
• Max Load: 1963 kN

• Capable to determine expansion and shrinkage curve, coefficient of thermal expansion, glass transition temperature and dilatometric softening point
• Up to 1750 °C
• Heating rates up to 30 °C/min

• SINTER SPS SYNTEX 3000
• Pressure: 100 kN
• Pressure: 5 kN
• Sintering Temperature: 2500 °C
• Sintering DC Pulse Generator Max. Output: 3,000 A

• Mixing, homogenizing and dispersing viscous materials by shear force between the rolls

• Preparation of feedstocks with high torque and temperature
• Dimensions (W x H x D):700 x 870 x 950 mm
• Torque deviation:± 0,15 %
• Speed: 0.2 to 185 min^-1

• Freezedrying of frozen samples
• Solvent: water, cyclohexane, diluted alcohols
• Chamber volume: 6.5 L
• Condensator temperature: -85 °C
• Sample temperature: approximately -35 °C
• Vacuum: 1×10^-3 mbar

• Used for grinding
• Speed: 400 rpm
• time: 99 h
• Different jar sizes available
• W x H x D: 836 x 1220 (1900) x 780 mm

• For characterization of nanoparticles and microparticles

• Additive manufacturing of filaments
• Build Volume: 25 ×21×21 cm
• Layer height: 0.05 – 0.35 mm
• hot end/heat bed temperature: 300 °C / 120 °C

• Large XL – Built chamber (up to 700mm x 500mm x 400mm)
• High friction feeding dual-print head with 2 nozzles
• Extruder temperature up to 450°C
• Suitable for most of commercially available filaments, used also for ceramic and magnetic filaments
• Layer thickness from 0.05 mm

• Used for printing ceramic suspensions
• Control unit (MDC 3290+)
• High precision valve based on a piezoelectric element (MDV 3280)
• Multifunctional controller (MFC universal)

• Lithography-based Ceramic Manufacturing
• Lateral resolution: 40µm
• Layer thickness: 10 – 100µm
• Dimensions (L x W x H): 1.05 x 0.85 x 1.78m

• Range: 0.02-2000 μm

• Analysis stations: 2
• Measurement types: B.E.T., STSA, adsorption isotherm, desorption isotherm
• Surface area range:01 m²/g
• Pore size range: 0.35 to >400 nm
• Minimum pore volume: 2.2 x 10^-6 ml/g

• Measuring both particle size and zeta potential in solution
• Effective range for particle sizing is 2nm – 3um
• Measurements can be made in a variety of media

• Measurement of rheological properties
• Plate on plate and cone on plate geometries available
• RheoCompass software
• Max. temperature: 200 °C

• Measuring range: 0.01 to 0.1 Kpa (140); 0.1 to 400 Kpa (440)
• Accuracy: Better than 0.2%
• Pore size (diameter): 116 – 3.8 µ (140); 15 – 0.0036 µ (440)
• Particle size (diameter): 330 – 15 µ (140); 40 – 0.01 µ (440)
• Volume detection system: Capacitive
• sample size for solid materials (d x h): 12×40 mm
• detection volume: 0.5 cc
• Volume resolution: 0.0001 cc

• Measures:
  • Resonant frequency
  • Damping or Internal Friction
  • Young’s modulus
  • Shear modulus
  • Poisson ratio
• Working temperature: room temperature
• Atmosphere: air

• Lights: simulated solar light, UVC 264 nm, etc.
• Temperature range: -10 to 100 °C

offers clean working conditions and protects from contamination of particles from the environment (dust free chamber). The cabinet is manufactured according to requirements of SIST EN 12469:2000 standard.

for deposition of a uniform film, of high precision and nanometric thickness, on the surface of a ceramic, metal, glass or polymer substrate.

• Wavelength range: 175 nm – 3300 nm
• Light source: tungsten-halogen and deuterium
• Detectors: photomultiplier R6872 for high energy in the entire UV/Vis wavelength range and high performance Peltier-cooled PbS detector for the NIR wavelength range